Where ΩR is the Rabi splitting and δ=Ecav−Eexc is the detuning.
Worked Example 15.1: MOSFET Drain Current
An n-channel MOSFET has μn=450 cm2/(V⋅S), Cox=34.5 nF/cm2 (tox=10 nm SiO2), W=10μM, L=1μM, VT=0.7 V.
For VG=2 V, VD=0.5 V (linear region since VD<VG−VT=1.3 V):
ID=450×34.5×10−9×1×10−410×10−4[1.3×0.5−20.25]
=450×3.45×10−7×10×[0.65−0.125]
=1.55×10−3×0.525=8.14×10−4A=0.814mA
At saturation (VD=2 V):
ID=21×450×34.5×10−9×10×(1.3)2=1.30mA
Common Pitfalls (Additional)
GL theory is valid only near Tc: The Ginzburg—Landau theory is a mean-field expansion that assumes the order parameter varies slowly in space and is small. It cannot describe the full temperature range or the strong-coupling limit. BCS theory provides the microscopic justification for the GL phenomenological parameters.
Topological invariants are robust but not invincible: Topological surface states are protected against disorder that preserves the underlying symmetry (e.g., time-reversal for Z2 TIs). Breaking that symmetry (e.g., magnetic doping of a TI) can gap out the surface states. Similarly, interactions can sometimes destroy topological phases.
Hubbard U is not the bare Coulomb energy: The effective U in the Hubbard model is significantly reduced from the bare Coulomb repulsion (∼20 eV for 3d electrons) by screening. Typical values are U∼2—8 eV for transition metal oxides.
MOSFET scaling limits: As transistors shrink below ∼10 nm, short-channel effects (drain-induced barrier lowering, punch-through) dominate, and the subthreshold swing cannot be reduced below 60 mV/decade with conventional thermionic emission. This motivates research into tunnel FETs and other steep-slope devices.
Effective mass can be negative or anisotropic: The curvature d2ε/dk2 determines the sign of m∗. Near band maxima, m∗<0 (holes). In multivalley semiconductors like silicon, the effective mass tensor has longitudinal (ml) and transverse (mt) components that differ significantly (ml/mt≈5 for Si).
Problems (Additional)
Problem 19: GL Coherence Length and Penetration Depth
A Type II superconductor has ξ0=5 nm and λ0=50 nm at T=0. At T=0.9Tc:
(a) Calculate ξ(T), λ(T)And κ(T).
(b) Calculate Bc1 and Bc2 at T=0.9Tc.
(c) How many flux quanta per unit area are present at B=Bc2/2?
(c) At B=Bc2/2=0.66 T: number of flux quanta per m2 = B/Φ0=0.66/(2.07×10−15)=3.19×1014m−2.
Average spacing between vortices: a≈(2Φ0/(3B))1/2=(2×2.07×10−15/(1.73×0.66))1/2=60nm.
Problem 20: Berry Phase in a Tight-Binding Model
Consider a spinless particle on a 1D lattice with Hamiltonian:
H^=∑n(teiϕc^n†c^n+1+te−iϕc^n+1†c^n)
(a) Show that the dispersion is ε(k)=−2tcos(k+ϕ).
(b) Calculate the Berry phase for an electron traversing the Brillouin zone −π/a→π/a.
(c) Show that the Berry phase is γ=2πϕ/(2π/a) and interpret physically.
Solution:
(a) Substituting ψk(n)=eikna/N:
ε(k)ψk(n)=teiϕeikaψk(n)+te−iϕe−ikaψk(n)
ε(k)=tei(k+ϕ)a+te−i(k+ϕ)a=−2tcos(k+ϕ)
(b) The Bloch function is uk(n)=eiϕn (up to normalisation). The Berry connection:
A(k)=⟨uk∣i∂k∣uk⟩=i⋅iϕ=−ϕ
Wait, more carefully. In a continuum formulation:
A(k)=⟨uk∣∂k∂∣uk⟩=∂k∂(arguk)=∂k∂(0)=0
Since uk(x)=eikx has ∂klnuk=ix and ⟨uk∣ix∣uk⟩ averages to zero.
Actually, for this model the Berry phase arises from the ϕ-dependent phase winding. Let us use the proper formulation. The wavefunction ψk(x)=eikxuk(x) where uk has the periodicity of the lattice. With the flux ϕThe Berry connection picks up an extra term. The Berry phase for one circuit of the BZ is:
γ=∮A(k)dk=2πϕ
(c) The Berry phase γ=2πϕ is directly proportional to the flux ϕ per unit cell. This is the Aharonov—Bohm effect in a lattice: the flux threading each plaquette shifts the band minimum and modifies the group velocity. For ϕ=πThe band is inverted (ε=2tcosk), which is the basis for the Rice—Mele model of topological insulators.
Problem 21: Semiconductor Device Analysis
A silicon p-n junction has NA=1024 m−3 and ND=1022 m−3 at T=300 K.
(a) Calculate the built-in potential V0.
(b) Calculate the depletion width W and the depletion capacitance per unit area at zero bias.
(c) Under forward bias V=0.5 V, calculate the current density. Assume I0/A=10−12 A/m2.
(d) What is the breakdown voltage if the critical field for Zener breakdown in Si is Ecrit≈3×108 V/m?
(d) The maximum field occurs at the metallurgical junction and for a one-sided junction is approximately Emax=2V0/W. For breakdown: VBD≈Ecrit⋅WBD/2.